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Subject: Scholarships for FAIC workshops

Scholarships for FAIC workshops

From: Abigail Choudhury <achoudhury<-a>
Date: Friday, April 29, 2011
FAIC/NEH Individual Professional Development Scholarship

Additional deadline added:  May 15, 2011

    <URL:http://www.conservation-us.org/index.cfm
        ?fuseaction=Page.viewPage&pageId=506&parentID=474
        #faicnehIndividualProfessionalDevelopmentScholarship>

With financial support from the National Endowment for the
Humanities, FAIC offers scholarships up to $1,000 to help defray
registration and travel expenses for participants in the FAIC
workshops supported by NEH.  In 2011, the eligible workshops are
Conservation of Outdoor Sculpture and Removal of Pressure-sensitive
Tape and Tape Stains from Photographic Materials.  All current AIC
members who are U.S. residents or citizens are eligible.

Use the standard FAIC application form attached. (This form is also
used for international scholarships for the FAIC Collaborative
Workshops in Photograph Conservation, although funding is not
provided by NEH.)

Conservation of Outdoor Sculpture
October 18-21, 2011
Course Fee: $550, AIC members, $750, non-members
(Fee includes lunches)
Enrollment Limit: 10

Registration Deadline: Review of applications will be made on a
rolling basis.  Last day to register, if space is available, is
September 6, 2011

    <URL:http://www.conservation-us.org/
        index.cfm?fuseaction=page.viewpage&pageid=1081>

    This advanced workshop will focus on current best practices for
    preserving outdoor sculpture, preventive conservation measures,
    and working within the varied contexts of museums, galleries,
    public art and private collections.  Conservation approaches for
    traditional and contemporary materials will be discussed. Local
    museums and outdoor sculpture sites will provide exposure to
    various contexts and approaches including, demonstrations, and
    hands-on testing and mock-ups.  Topics will include graffiti
    protection and removal, cleaning, coatings and materials
    substrate repair.

The Treatment of Pressure Sensitive Tapes and Tape Stains on
    Photographs
November 28-December 2, 2011
At the National Conservation Training Center
Shepherdstown, West Virginia

    <URL:http://www.conservation-us.org/
        index.cfm?fuseaction=page.viewpage&pageid=1386>

    Supported in part by grants from The Andrew W. Mellon Foundation
    and The National Endowment for the Humanities

    The course consists of lectures as well as hands-on sessions
    presented in a laboratory setting.  The five day curriculum
    includes:

        Overview of pressure sensitive tapes, production methods,
        and manufacturing history

        Science overview of adhesion and pressure sensitive adhesive
        characteristics, and the potential interaction of treatment
        methods and materials with photographs

        Methods of tape and adhesive identification: physical,
        chemical, optical

        Removal techniques; use of heat, mechanical means, and
        organic solvents

        Health and Safety aspects of organic solvent use

        Remediation and stain removal using organic solvents and
        wash methods

        Collections care and decision-making

        Experimental treatments of photographic materials with
        pressure sensitive tapes will be undertaken

    **** Moderator's comments: The above URLs have been wrapped for
    email. There should be no newlines.

For more information, contact:

    Abigail Choudhury
    Development and Education Associate
    Foundation of the American Institute for Conservation of
        Historic and Artistic Works
    1156 15th Street, NW, Suite 320
    Washington, DC20005
    202-661-8070
    Fax: 202-452-9328
    achoudhury<-a t->conservation-us< . >org


                                  ***
                  Conservation DistList Instance 24:50
                    Distributed: Monday, May 2, 2011
                       Message Id: cdl-24-50-010
                                  ***
Received on Friday, 29 April, 2011

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